Depth of Investigation (DOI) analysis for IP/Resistivity inversions
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PeterDiorio
Posts: 4

in Oasis montaj
What approaches are people using to evaluate Depth of Investigation (DOI) for VOXI IP/Resistivity inversion?
Does anyone have guidance to help set parameters when using VOXI?
Specifically I am looking for guidance for setting Starting model /Reference model /Parameter Weighting for each of resistivity and IP and formulation of the DOI function, analogous to the method discussed in Oldenburg and Li 1994, Estimating depth of investigation in dc resistivity and IP surveys.
Have people found this effective?
Are there any alternate approaches that others have found useful?
Does anyone have guidance to help set parameters when using VOXI?
Specifically I am looking for guidance for setting Starting model /Reference model /Parameter Weighting for each of resistivity and IP and formulation of the DOI function, analogous to the method discussed in Oldenburg and Li 1994, Estimating depth of investigation in dc resistivity and IP surveys.
Have people found this effective?
Are there any alternate approaches that others have found useful?
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Thanks Taronish. Completing multiple forward models is a reasonable way forward for a specific case but I was actually hoping for something a bit more generic. For example: often the top of a feature is very clear in the model but the bottom is much less well defined. It can be very hard to determine if I am a I looking at depth-limited body or just the fall-off in sensitivity with depth for this particular array, electrical environment and set of inversion constraints. The Oldenburg-Li paper specifies a couple of approaches but I struggle to map their recipes to VOXI parameters.0
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